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J. Feldmann, K. W. Goossen, D. A. B. Miller,
A. M. Fox, J. E. Cunningham, W. Y. Jan, "Fast escape of photocreated carriers out of
shallow quantum wells" Appl. Phys. Lett. 59, 66-68, (1991). The
authors report that at room temperature the field-induced escape of photogenerated
carriers out of shallow GaAs/Al/sub x/Ga/sub 1-x/As multiple quantum wells is as fast as
for pure GaAs of the same thickness, if the value of x does not exceed 0.04. Their
experimental findings can be explained by assuming that carriers are efficiently scattered
into the unconfined barrier states by absorption of a LO phonon, as long as the effective
barrier height is less than the LO-phonon energy. The application of shallow quantum wells
with xless than or=0.04 in self-electro-optic effect devices, providing not only strong excitonic electroabsorption but also fast sweep-out times at small biases, should lead to shorter switching times |
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