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D. Knipp,
H. Stiebig, S. R. Bhalotra, H. L. Kung, and D. A. B. Miller,
"Thin fil m technology based micro-Fourier spectrometer," in
SPIE Photonics West 2003, San Jose, California (January 25-31, 2003).
Paper 4983-15.
A novel
Fourier spectrometer using thin film technology was developed. The
spectrometer based on a semitransparent thin film detector in
combination with a tunable micro machined mirror. The semitransparent
detector is introduced into a standing wave created in front of the
mirror to sample the profile of the standing wave. Varying the
position of the mirror results in a shift of the phase of the standing
waves and thus in a change of the optical generation profile within
the semi transparent detector. The active region of the sensor
(thickness × absorption)
is thinner than the wavelength of the incoming light, so that the
modulation of the intensity results in a modulation of the overall
photocurrent. The spectral information of the incoming light can be
determined by the Fourier transformation of the sensor signal. Based
on the linear arrangement of the sensor and the mirror, the
spectrometer facilitates the realization of 1D and 2D arrays of
spectrometers combining medium range spectral resolution with medium
range spatial resolution. The novel device is filling the gap between
solid-state camera technology with only three-color channels (red,
green and blue) but high spatial resolution on one hand and precision
spectrometers with high spectral resolution but no spatial resolution
on the other hand. An analytical optical model of the spectrometer was
applied to evaluate different detector concepts. The model was used to
study the performance of different device designs regarding the
spectral resolution of the spectrometer, the spectral range and the
linearity of the response. The calculations will be compared with
experimental results of semi transparent amorphous silicon detectors.
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