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Dietmar
Knipp, Helmut Stiebig, Sameer R. Bhalotra, Eerke Bunte, Helen L. Kung,
and David A. B. Miller, "Silicon-Based Micro-Fourier Spectrometer," IEEE
Trans. on Electron Devices 52 (3), pgs. 419‑426 (March 2005).
A novel Fourier spectrometer based on a
partly transparent thin-film detector in combination with a tunable
silicon micromachined mirror was developed. The operation principle
based on the detection of an intensity profile of a standing-wave by
introducing a partly transparent detector in the standing-wave. Varying
the position of the mirror results in a phase shift of the standing-wave
and thus in a change of the optical intensity profile within the
detector. The photoelectric active region of the sensor is thinner than
the wavelength of the incoming light, so that the modulation of the
intensity leads to the modulation of the photocurrent. The spectral
information of the incoming light can be determined by the Fourier
transform of the sensor signal. Based on the linear arrangement of the
sensor and the mirror, the spectrometer facilitates the realization of
one- and two-dimensional arrays of spectrometers combining spectral and
spatial resolution. The operation principle of the spectrometer will be
described and the influence of the detector design on the spectrometer
performance will be discussed. A spectral resolution of down to 6 nm was
achieved under real-time imaging conditions.
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